Optical Pattern Fabrication in Amorphous Silicon Carbide with High-Energy Focused Ion Beams
نویسندگان
چکیده
منابع مشابه
Three-dimensional micromachining of silicon using focused high-energy ion beams
There are many techniques available for two-dimensional machining and patterning of semiconductor surfaces for optoelectronic and microelectronic applications. These mainly use photolithography, electron beam or X-ray lithography or reactive ion etching. Smooth surfaces and high-aspect ratio sidewalls can be produced, but they are all limited to creating a single etch depth per processing stage...
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ژورنال
عنوان ژورنال: Acta Physica Polonica A
سال: 2011
ISSN: 0587-4246,1898-794X
DOI: 10.12693/aphyspola.120.56